Anunțul 545207-2026 pentru Germania – Diverse utilaje de uz general şi special – Waferreiniger / Maskenreiniger (IAF-08.3) - PR1146362-2050-P este publicat de Fraunhofer-Gesellschaft - Einkauf B12 și este încadrat la codul CPV 42900000.
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Wafer cleaner / mask cleaner (IAF-08.3) The requirement is for a wafer and mask cleaning machine to be installed in an ISO Class 4 cleanroom and which must comply with European safety regulations for industrial equipment. The system is intended to remove particles and contaminants from wafers and lithography masks using aqueous and acidic solutions, based on the RCA cleaning process. To ensure safe operation and a long service life, the process chamber must be made of process-media-resistant material and be equipped with an extraction system and leak detection. The system must be capable of reliably removing particles larger than 250 nm from (quartz) glass or wafers in order to ensure the purity required for the processes in the Fraunhofer IAF cleanroom and not to compromise process yield. Translated with DeepL.com (free version)
Eed applicable LOT
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Electronic auction LOT
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Eu fund LOT
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Gpa LOT
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Identifier LOT
LOT-0000
Termene și durate2
Duration period unit LOT
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Duration period value LOT
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Procedură și anunț13
Form type
result
Legal basis
32014L0024
Legal basis NOTICE
32014L0024
Legal basis PROC
vgv
NOTICE identifier
c31d97e9-0bbf-448d-bd66-d09515f753e6
NOTICE preferred publication date
2026-08-04T00:00:00+02:00
NOTICE subtype
29
NOTICE title
Germania – Diverse utilaje de uz general şi special – Waferreiniger / Maskenreiniger (IAF-08.3) - PR1146362-2050-P
NOTICE type
can-standard
NOTICE version
Clasificare CPV5
Classification cpv
42900000 | 42900000
Main classification LOT
42900000
Main classification PROC
42900000
Main classification type LOT
cpv
Main classification type PROC
cpv
Valori1
Total value CUR
EUR
Date de contact publicate în TED
14
Contactele sunt disponibile utilizatorilor autentificați.Autentifică-te
Textul integral publicat de TEDextinde
Preis
Technik
Fraunhofer-Gesellschaft - Einkauf B12
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
Waferreiniger / Maskenreiniger (IAF-08.3)
Vergabekammern des Bundes
1 Stück Waferreiniger / Maskenreiniger (IAF-08.3) Beschafft werden soll ein Wafer- und Maskenreinigungsgerät, das in einem Reinraum der ISO-Klasse 4 aufgestellt werden soll und den europäischen Sicherheitsvorschriften für Industrieanlagen entsprechen muss. In der Anlage sollen Wafer und Lithographie-Masken in Anlehnung an den RCA-Reinigungsprozess mit Hilfe wässriger und saurer Lösungen von Partikeln und Verschmutzungen befreit werden. Um sicheres Arbeiten und eine hohe Langlebigkeit zu gewährleisten, muss die Prozesskammer aus prozessmedienresistentem Material gefertigt sein und über eine Absaugung sowie eine Leckageerkennung verfügen. Die Anlage muss in der Lage sein, Partikel größer als 250 nm zuverlässig von (Quarz-)Glas oder Wafern zu entfernen, um die für die Prozesse im Reinraum des Fraunhofer IAF erforderliche Reinheit sicherzustellen und die Prozessausbeute nicht zu beeinträchtigen.
AP und S International GmbH
Waferreiniger / Maskenreiniger (IAF-08.3) - PR1146362-2050-P
Datenservice Öffentlicher Einkauf (in Verantwortung des Beschaffungsamts des BMI)
01
DE 129515865
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https://vergabe.fraunhofer.de/
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PR1146362-2050-P
2000-01-01+01:00
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ORG-7006
150/2026 | Technical Specification
Wafer cleaner / mask cleaner (IAF-08.3) The requirement is for a wafer and mask cleaning machine to be installed in an ISO Class 4 cleanroom and which must comply with European safety regulations for industrial equipment. The system is intended to remove particles and contaminants from wafers and lithography masks using aqueous and acidic solutions, based on the RCA cleaning process. To ensure safe operation and a long service life, the process chamber must be made of process-media-resistant material and be equipped with an extraction system and leak detection. The system must be capable of reliably removing particles larger than 250 nm from (quartz) glass or wafers in order to ensure the purity required for the processes in the Fraunhofer IAF cleanroom and not to compromise process yield. Translated with DeepL.com (free version)
Price
Wafer cleaner / mask cleaner (IAF-08.3)
Fraunhofer-Gesellschaft - Einkauf B12
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
technical specification
Vergabekammern des Bundes
AP und S International GmbH
Wafer cleaner / mask cleaner (IAF-08.3) - PR1146362-2050-P
Datenservice Öffentlicher Einkauf (in Verantwortung des Beschaffungsamts des BMI)
01
DE 129515865
selec-w
https://vergabe.fraunhofer.de/
https://www.fraunhofer.de
t-sme
none
t:02 ••• ••• 66
t-oth-eea
PR1146362-2050-P
2000-01-01+01:00
supplies
price
80686
t-esubm
pub-undert
ORG-[telefon eliminat]
gen-pub
2026-08-06+02:00
EUR
14
-1
42900000
CON-0001
Tullastr. 72
Kaiser-Friedrich-Straße 16
no-eu-funds
quality
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32014L0024
Freiburg
[telefon eliminat]
per-exa
3
4
0204:994-DOEVD-83
5
53113
15:31:29+02:00
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true
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Hansastraße 27c
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https://vergabe.fraunhofer.de/NetServer/
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ORG-7006
150/2026
Wafer cleaner / mask cleaner (IAF-08.3) The requirement is for a wafer and mask cleaning machine to be installed in an ISO Class 4 cleanroom and which must comply with European safety regulations for industrial equipment. The system is intended to remove particles and contaminants from wafers and lithography masks using aqueous and acidic solutions, based on the RCA cleaning process. To ensure safe operation and a long service life, the process chamber must be made of process-media-resistant material and be equipped with an extraction system and leak detection. The system must be capable of reliably removing particles larger than 250 nm from (quartz) glass or wafers in order to ensure the purity required for the processes in the Fraunhofer IAF cleanroom and not to compromise process yield. Translated with DeepL.com (free version)
42900000 — Echipamente industriale
Durată: 14 MONTH
LOT-0000
Câștigător: AP und S International GmbH · CUI DE814744180
Detalii licitație
Descriere
Wafer cleaner / mask cleaner (IAF-08.3)
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